Titanium Aluminum Sputtering Targets are produced by HIP technology, widely used for tool coating and decorative coating.Comparing with melting technology, TiAl targets produced by HIP technology have more uniform micro-inner structure, smaller grain size, and suitable for various magnetron sputtering machines and ion plating machines. End user can obtain constant erosion rates as well as high purity and homogeneous thin film coating during PVD process. 

      The tools coated by TiAlN thin films have higher feed speeds, better cutting performance, longer service life and higher metal removal rates can be achieved without difficulty.

      Titanium Aluminum Sputtering Targets and arc cathodes also are also used for decorative coating, to coating golden brown and brownish black color films. End user can obtain good hardness, high brightness, corrosion and oxidation resistant color without discolor for a very long time. Our targets have already been qualified by many ender users, inculuding manufacturers of watch, sanitary ware, car mirrors, etc.
 

Features

Chemical Composition (at%): TiAl 25/75, TiAl 30/70, TiAl 33/67, TiAl 40/60, TiAl 50/50, TiAl 75/25

Segregation of weight: +/-0.2wt%

Available Purity: 2N5, 2N8, 3N

Production Technology: HIP

Shapes: planar targets, rotary target

Average Grain Size: < 100um

Available targets / cathodes for tools coating application 

Available targets / cathodes for decorative application 

                                    
                                                          PRODUCTION PROCESS